Evaluation of Piezoelectric Ta 2 O 5 Thin Films Deposited on Sapphire Substrates
X -axis-oriented tantalum pentoxide (Ta 2 O 5 ) piezoelectric thin films were deposited on sapphire (Al 2 O 3 ) substrates, from which single crystallization due to epitaxial growth can be expected, using an RF magnetron sputtering system. The crystallinity and Rayleigh-type surface acoustic wave (R...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2013-07, Vol.52 (7S), p.7 |
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Hauptverfasser: | , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | X
-axis-oriented tantalum pentoxide (Ta
2
O
5
) piezoelectric thin films were deposited on sapphire (Al
2
O
3
) substrates, from which single crystallization due to epitaxial growth can be expected, using an RF magnetron sputtering system. The crystallinity and Rayleigh-type surface acoustic wave (R-SAW) propagation properties of the thin films were evaluated. From the measured diffraction (X-ray diffraction) patterns and the spotted pattern in the measured pole figures, in which poles were arranged to form the vertices of a hexagon, the possibility of the crystallization of hexagonal Ta
2
O
5
with a (203)-plane oriented in the
c
-Al
2
O
3
substrate plane due to epitaxial growth was shown. For the first mode of the R-SAW on the Ta
2
O
5
/
R
-plane Al
2
O
3
sample, a coupling factor of 1.65% and a phase velocity of 5,120 m/s were obtained for a normalized thickness of 0.175. Unfortunately, no increase in coupling factor and no major improvement in propagation loss were observed upon the crystallization of hexagonal Ta
2
O
5
. |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.52.07HD06 |