Evaluation of Piezoelectric Ta 2 O 5 Thin Films Deposited on Sapphire Substrates

X -axis-oriented tantalum pentoxide (Ta 2 O 5 ) piezoelectric thin films were deposited on sapphire (Al 2 O 3 ) substrates, from which single crystallization due to epitaxial growth can be expected, using an RF magnetron sputtering system. The crystallinity and Rayleigh-type surface acoustic wave (R...

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Veröffentlicht in:Japanese Journal of Applied Physics 2013-07, Vol.52 (7S), p.7
Hauptverfasser: Iwamoto, Shunsuke, Saigusa, Ryosuke, Kakio, Shoji
Format: Artikel
Sprache:eng
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Zusammenfassung:X -axis-oriented tantalum pentoxide (Ta 2 O 5 ) piezoelectric thin films were deposited on sapphire (Al 2 O 3 ) substrates, from which single crystallization due to epitaxial growth can be expected, using an RF magnetron sputtering system. The crystallinity and Rayleigh-type surface acoustic wave (R-SAW) propagation properties of the thin films were evaluated. From the measured diffraction (X-ray diffraction) patterns and the spotted pattern in the measured pole figures, in which poles were arranged to form the vertices of a hexagon, the possibility of the crystallization of hexagonal Ta 2 O 5 with a (203)-plane oriented in the c -Al 2 O 3 substrate plane due to epitaxial growth was shown. For the first mode of the R-SAW on the Ta 2 O 5 / R -plane Al 2 O 3 sample, a coupling factor of 1.65% and a phase velocity of 5,120 m/s were obtained for a normalized thickness of 0.175. Unfortunately, no increase in coupling factor and no major improvement in propagation loss were observed upon the crystallization of hexagonal Ta 2 O 5 .
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.52.07HD06