InGaN Light-Emitting Diode with a Nanoporous/Air-Channel Structure

High-efficiency InGaN light-emitting diode (LED) with an air-channel structure and a nanoporous structure was fabricated. The air-channel structure was formed through an epitaxial regrowth process on a dry-etched undoped GaN nanorod structure. The GaN:Si nanoporous structure embedded in treated LED...

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Veröffentlicht in:Applied physics express 2013-01, Vol.6 (1), p.012103-012103-3
Hauptverfasser: Jiang, Ren-Hao, Lin, Chia-Feng, Yang, Chung-Chieh, Fan, Feng-Hsu, Huang, Yu-Chieh, Tseng, Wang-Po, Cheng, Po-Fu, Wu, Kaun-Chun, Wang, Jing-Hao
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container_title Applied physics express
container_volume 6
creator Jiang, Ren-Hao
Lin, Chia-Feng
Yang, Chung-Chieh
Fan, Feng-Hsu
Huang, Yu-Chieh
Tseng, Wang-Po
Cheng, Po-Fu
Wu, Kaun-Chun
Wang, Jing-Hao
description High-efficiency InGaN light-emitting diode (LED) with an air-channel structure and a nanoporous structure was fabricated. The air-channel structure was formed through an epitaxial regrowth process on a dry-etched undoped GaN nanorod structure. The GaN:Si nanoporous structure embedded in treated LED structures was fabricated through a photoelectrochemical wet etching process in an oxalic acid solution. Light output powers were enhanced 1.48- and 1.75-fold for the LEDs with an air-channel structure and with a nanoporous/air-channel structure, respectively, in comparison with that of a conventional LED structure. The air-channel structure and the nanoporous GaN:Si structure in the treated LED structures provided high-light-extraction structures.
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title InGaN Light-Emitting Diode with a Nanoporous/Air-Channel Structure
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