Progress and perspectives in dry processes for leading-edge manufacturing of devices: toward intelligent processes and virtual product development

Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface...

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Veröffentlicht in:Japanese Journal of Applied Physics 2019-06, Vol.58 (SE), p.SE0804
Hauptverfasser: Iwase, Taku, Kamaji, Yoshito, Kang, Song Yun, Koga, Kazunori, Kuboi, Nobuyuki, Nakamura, Moritaka, Negishi, Nobuyuki, Nozaki, Tomohiro, Nunomura, Shota, Ogawa, Daisuke, Omura, Mitsuhiro, Shimizu, Tetsuji, Shinoda, Kazunori, Sonoda, Yasushi, Suzuki, Haruka, Takahashi, Kazuo, Tsutsumi, Takayoshi, Yoshikawa, Kenichi, Ishijima, Tatsuo, Ishikawa, Kenji
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Sprache:eng
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Zusammenfassung:Semiconductor device production has grown year on year, with high-volume manufacturing supported by advances in plasma processes. In plasma-based processing, ions and reactive species synergistically enhance chemical reactions, whose kinetics is in a nonequilibrium state in the region of the surface subjected to ion bombardment. To control such processing, methods for process monitoring, equipment control, modeling and simulation, and controlling plasma-induced damage, are required. Here, we conduct a systematic review of the literature over the last 40 years to evaluate the history and progress of dry processes in regard to intelligent process-control. We also address the challenges of implementing "virtual product development" utilizing information technology.
ISSN:0021-4922
1347-4065
DOI:10.7567/1347-4065/ab163b