Characteristics of the Anodized Layer of Sputterd Aluminum Films

Two-step anodization was used to form an anodized layer on a sputtered aluminum thin film on a glass substrate. The voltage-current characteristics of the anodized layer depended on substrate temperature at the time of aluminum film formation. Aluminum and oxygen profiles of the anodized layer obtained by Auger analysis and Ar ion etching showed that there was a transition layer from metal to oxide and the thickness of the layer depended on the substrate temperature.