Silica Deposition onto Porous Anodic Oxide Film on Aluminum in a Solution of Tetraethoxysilane by Electrophoresis

Silica deposition on the surface and inner pores of the porous anodic oxide film on aluminum was achieved by the electrophoresis of tetraethoxysilane in its solution. The deposition occured electrophoretically at the electrolytic voltage ranging from 20 to 60 V. Silica-deposited film showed a high hardness of 420 in Hv after heat treatment. About 4% of Si distributed on the surface and inner pores of the film was observed by Electron prove microanalysis.