Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon

Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon

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Veröffentlicht in:Journal of the Korean Physical Society 2002-04, Vol.40 (4), p.737
Hauptverfasser: Min-Joo, Kim, Hyo-Jick, Choi, Dae-Hong, Ko, Ja-Hum, Ku, Siyoung, Choi, Kazuyuki, Fujihara, Cheol-Woong, Yang
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container_end_page
container_issue 4
container_start_page 737
container_title Journal of the Korean Physical Society
container_volume 40
creator Min-Joo, Kim
Hyo-Jick, Choi
Dae-Hong, Ko
Ja-Hum, Ku
Siyoung, Choi
Kazuyuki, Fujihara
Cheol-Woong, Yang
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doi_str_mv 10.3938/jkps.40.737
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_3938_jkps_40_737</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_3938_jkps_40_737</sourcerecordid><originalsourceid>FETCH-LOGICAL-c231t-7bcfdddd229a1c7aff61b70eccb3cce44fb967989f12331cab7fec614e20dca73</originalsourceid><addsrcrecordid>eNotkMFKxDAQQHNQcF09-QM5KpKaNKFpj0uxrrCgsPVc0mmCWdOmJAXp35tV5zLMg3mHh9AdoxmvePl0-ppjJmgmubxAG8qlIKIsxRW6jvFEqeBcFhv03fgwqsX6CatpwO2nTqfDx0X11tllxd7g1pJazbMecO1JTBjsoLEJfjyDVuGdc37FjXVjxEl0zyh9wEf7a3z3boWwxkU5ZyedcPr30w26NMpFffu_t-ijeW7rPTm8vbzWuwOBnLOFyB7MkCbPK8VAKmMK1kuqAXoOoIUwfVXIqqwMyzlnoHppNBRM6JwOoCTfosc_LwQfY9Cmm4MdVVg7Rrtzp-7cqRO0S534DxQLX38</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon</title><source>EZB-FREE-00999 freely available EZB journals</source><creator>Min-Joo, Kim ; Hyo-Jick, Choi ; Dae-Hong, Ko ; Ja-Hum, Ku ; Siyoung, Choi ; Kazuyuki, Fujihara ; Cheol-Woong, Yang</creator><creatorcontrib>Min-Joo, Kim ; Hyo-Jick, Choi ; Dae-Hong, Ko ; Ja-Hum, Ku ; Siyoung, Choi ; Kazuyuki, Fujihara ; Cheol-Woong, Yang</creatorcontrib><identifier>ISSN: 0374-4884</identifier><identifier>DOI: 10.3938/jkps.40.737</identifier><language>eng</language><ispartof>Journal of the Korean Physical Society, 2002-04, Vol.40 (4), p.737</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c231t-7bcfdddd229a1c7aff61b70eccb3cce44fb967989f12331cab7fec614e20dca73</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Min-Joo, Kim</creatorcontrib><creatorcontrib>Hyo-Jick, Choi</creatorcontrib><creatorcontrib>Dae-Hong, Ko</creatorcontrib><creatorcontrib>Ja-Hum, Ku</creatorcontrib><creatorcontrib>Siyoung, Choi</creatorcontrib><creatorcontrib>Kazuyuki, Fujihara</creatorcontrib><creatorcontrib>Cheol-Woong, Yang</creatorcontrib><title>Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon</title><title>Journal of the Korean Physical Society</title><issn>0374-4884</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2002</creationdate><recordtype>article</recordtype><recordid>eNotkMFKxDAQQHNQcF09-QM5KpKaNKFpj0uxrrCgsPVc0mmCWdOmJAXp35tV5zLMg3mHh9AdoxmvePl0-ppjJmgmubxAG8qlIKIsxRW6jvFEqeBcFhv03fgwqsX6CatpwO2nTqfDx0X11tllxd7g1pJazbMecO1JTBjsoLEJfjyDVuGdc37FjXVjxEl0zyh9wEf7a3z3boWwxkU5ZyedcPr30w26NMpFffu_t-ijeW7rPTm8vbzWuwOBnLOFyB7MkCbPK8VAKmMK1kuqAXoOoIUwfVXIqqwMyzlnoHppNBRM6JwOoCTfosc_LwQfY9Cmm4MdVVg7Rrtzp-7cqRO0S534DxQLX38</recordid><startdate>20020401</startdate><enddate>20020401</enddate><creator>Min-Joo, Kim</creator><creator>Hyo-Jick, Choi</creator><creator>Dae-Hong, Ko</creator><creator>Ja-Hum, Ku</creator><creator>Siyoung, Choi</creator><creator>Kazuyuki, Fujihara</creator><creator>Cheol-Woong, Yang</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20020401</creationdate><title>Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon</title><author>Min-Joo, Kim ; Hyo-Jick, Choi ; Dae-Hong, Ko ; Ja-Hum, Ku ; Siyoung, Choi ; Kazuyuki, Fujihara ; Cheol-Woong, Yang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c231t-7bcfdddd229a1c7aff61b70eccb3cce44fb967989f12331cab7fec614e20dca73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Min-Joo, Kim</creatorcontrib><creatorcontrib>Hyo-Jick, Choi</creatorcontrib><creatorcontrib>Dae-Hong, Ko</creatorcontrib><creatorcontrib>Ja-Hum, Ku</creatorcontrib><creatorcontrib>Siyoung, Choi</creatorcontrib><creatorcontrib>Kazuyuki, Fujihara</creatorcontrib><creatorcontrib>Cheol-Woong, Yang</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Korean Physical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Min-Joo, Kim</au><au>Hyo-Jick, Choi</au><au>Dae-Hong, Ko</au><au>Ja-Hum, Ku</au><au>Siyoung, Choi</au><au>Kazuyuki, Fujihara</au><au>Cheol-Woong, Yang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon</atitle><jtitle>Journal of the Korean Physical Society</jtitle><date>2002-04-01</date><risdate>2002</risdate><volume>40</volume><issue>4</issue><spage>737</spage><pages>737-</pages><issn>0374-4884</issn><doi>10.3938/jkps.40.737</doi></addata></record>
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title Formation and Thermal Stability of Ti-Capped Co-silicide from Co-Ta Alloy Films on (100) Si and Polycrystalline Silicon
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T02%3A16%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Formation%20and%20Thermal%20Stability%20of%20Ti-Capped%20Co-silicide%20from%20Co-Ta%20Alloy%20Films%20on%20(100)%20Si%20and%20Polycrystalline%20Silicon&rft.jtitle=Journal%20of%20the%20Korean%20Physical%20Society&rft.au=Min-Joo,%20Kim&rft.date=2002-04-01&rft.volume=40&rft.issue=4&rft.spage=737&rft.pages=737-&rft.issn=0374-4884&rft_id=info:doi/10.3938/jkps.40.737&rft_dat=%3Ccrossref%3E10_3938_jkps_40_737%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true