Characterization of dislocation of halide vapor phase epitaxial (001) β-Ga 2 O 3 by ultrahigh sensitive emission microscopy and synchrotron X-ray topography and its influence on Schottky barrier diodes

This study elucidates the dislocation responsible for the leakage current in a halide vapor phase epitaxial (001) β-Ga 2 O 3 Schottky barrier diode. A high reverse leakage current of −0.98 μ A was observed at −100 V as an emission pattern via ultrahigh-sensitive emission microscopy. This was attribu...

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Veröffentlicht in:Japanese Journal of Applied Physics 2023-06, Vol.62 (SF), p.SF1001
Hauptverfasser: Sdoeung, Sayleap, Sasaki, Kohei, Kawasaki, Katsumi, Hirabayashi, Jun, Kuramata, Akito, Kasu, Makoto
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container_issue SF
container_start_page SF1001
container_title Japanese Journal of Applied Physics
container_volume 62
creator Sdoeung, Sayleap
Sasaki, Kohei
Kawasaki, Katsumi
Hirabayashi, Jun
Kuramata, Akito
Kasu, Makoto
description This study elucidates the dislocation responsible for the leakage current in a halide vapor phase epitaxial (001) β-Ga 2 O 3 Schottky barrier diode. A high reverse leakage current of −0.98 μ A was observed at −100 V as an emission pattern via ultrahigh-sensitive emission microscopy. This was attributed to the presence of dislocation. Moreover, the Burgers vector of this dislocation was determined to be ⫽ 〈1 3 ¯ 2〉 from the g · b invisibility criteria via synchrotron X-ray topography observation. This dislocation was speculated to be induced by the relaxation of the strain field surrounding the void and subsequently propagated to the surface. Cross-sectional scanning transmission electron microscopy revealed multiple threading dislocations along the (100) plane.
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title Characterization of dislocation of halide vapor phase epitaxial (001) β-Ga 2 O 3 by ultrahigh sensitive emission microscopy and synchrotron X-ray topography and its influence on Schottky barrier diodes
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