MAGNETIC PROPERTIES DEPENDENCE OF Co-Cr FILMS ON MAGNETRON SPUTTERING CATHODE

In order to clarify the influence of the magnetic field distribution on the magnetic properties of Co-Cr films in a planar magnetron sputtering system, different kinds of sputtering cathodes were prepared. The point at which Hc for the Co-Cr films became a maximum coincided qualitatively with the point at which the perpendicular component of the magnetic field was zero. A superimposition of the magnetic field normal to the target can be expected to induce a shift of this point, and a change in magnetic properties. In roll sputtering, the caracteristics of the cathode affected the magnetic properties of the Co-Cr film at lower roll temperatures, but at higher roll temperatures, the magnetic properties of the Co-Cr films were little influenced by the distribution of plasma density.