THE MAGNETIC ANISOTROPY AND COLUMNAR STRUCTURE OF OBLIQUELY SPUTTERED Co-Cr FILMS
The shape magnetic anisotropy contribution for Co-Cr films, which were normally and obliquely magnetron sputtered was studied. Both Co-Cr films deposited by atoms from one line source and from two line sources showed a columnar structure, and the inclination angle of the column approximately coincid...
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Veröffentlicht in: | Journal of the Magnetics Society of Japan 1989, Vol.13(S_1_PMRC_89), pp.S1_703-708 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The shape magnetic anisotropy contribution for Co-Cr films, which were normally and obliquely magnetron sputtered was studied. Both Co-Cr films deposited by atoms from one line source and from two line sources showed a columnar structure, and the inclination angle of the column approximately coincided with the angle of the incident beam angle. From the torque curve analysis, magnetocrystalline anisotropy was found to play a principal part in the magnetic anisotropy of Co-Cr films deposited using two line sources. However, in the case of the Co-Cr film sputtered by one line source, not only magnetocrystalline anisotropy but shape magnetic anisotropy due to the columnar structure played an important role in determining the magnetic properties of Co-Cr films. |
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ISSN: | 0285-0192 1880-4004 |
DOI: | 10.3379/jmsjmag.13.S1_703 |