Properties of YSZ Thin Films for SOFC Grown by Sputtering
Thin films of yttria stabilized zirconia (YSZ) for solid oxide fuel cells (SOFCs) were grown on porous Ni substrates by RF magnetron sputtering under the prepared conditions of reduced pressures form 0.4 to 0.9 Pa and substrate temperatures from room temperature to 500°C. Sputtered films were found...
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Veröffentlicht in: | SHINKU 1998/03/20, Vol.41(3), pp.190-193 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng ; jpn |
Online-Zugang: | Volltext |
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Zusammenfassung: | Thin films of yttria stabilized zirconia (YSZ) for solid oxide fuel cells (SOFCs) were grown on porous Ni substrates by RF magnetron sputtering under the prepared conditions of reduced pressures form 0.4 to 0.9 Pa and substrate temperatures from room temperature to 500°C. Sputtered films were found to be the fully stabilized zirconia ones having cubic structures at those prepared conditions. A SOFC having YSZ films indicated a stable power generation property during 15 hours with 0.45 V although its value was reduced to lower half than the theoretical OCV of 0.915 V. |
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ISSN: | 0559-8516 1880-9413 |
DOI: | 10.3131/jvsj.41.190 |