Characteristics of Ta2O5 Thin Films Prepared by Off-axis PLD Method Using an Aperture Plate

Crystalline characteristics of Ta2O5 thin films prepared by off-axis pulsed laser deposition method (PLD) using an aperture plate were investigated. The film thickness at the center of substrate was the largest. The results of x-ray diffraction measurement showed that the crystalline quality at the film edge close to the target was better than that far from the target. These results are very useful for depositing the oxide thin films by the off-axis PLD method using an aperture.