Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device

Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:SHINKU 1982/04/20, Vol.25(4), pp.249-252
Hauptverfasser: YAMASHITA, Masaya, BABA, Shigeru, KINBARA, Akira
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 252
container_issue 4
container_start_page 249
container_title SHINKU
container_volume 25
creator YAMASHITA, Masaya
BABA, Shigeru
KINBARA, Akira
description
doi_str_mv 10.3131/jvsj.25.249
format Article
fullrecord <record><control><sourceid>jstage_cross</sourceid><recordid>TN_cdi_crossref_primary_10_3131_jvsj_25_249</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>article_jvsj1958_25_4_25_4_249_article_char_en</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3039-6e919726a9042c5eaa54add6d709cbf2e5cc2e09ea3a7f8ca5a831c760ce7043</originalsourceid><addsrcrecordid>eNo90M1OwkAUBeCJ0USCrHyB2Zvi_LadJQERE4wmYIyryWV6C4OlkJlC4ttLBdncuzhfzuIQcs9ZX3LJH9eHuO4L3RfKXJEOz3OWGMXlNekwrU2Sa57ekl6MfsGkVIxppTvk_RUh7gNusG4i3ZZ0vvLuu8YYKdQFne32TYPB10v65bEq_klNx77aRPoR2wjobPBJR3jwDu_ITQlVxN75d8l8_DQfTpLp2_PLcDBNnGTSJCkabjKRgmFKOI0AWkFRpEXGjFuUArVzAplBkJCVuQMNueQuS5nDjCnZJQ-nWhe2MQYs7S74DYQfy5lt57DtHFZoe5zjqEcnvY4NLPFiITTeVfhnudF569X5KHOJ3QqCxVr-Amqja9U</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device</title><source>J-STAGE (Japan Science &amp; Technology Information Aggregator, Electronic) Freely Available Titles - Japanese</source><creator>YAMASHITA, Masaya ; BABA, Shigeru ; KINBARA, Akira</creator><creatorcontrib>YAMASHITA, Masaya ; BABA, Shigeru ; KINBARA, Akira</creatorcontrib><identifier>ISSN: 0559-8516</identifier><identifier>EISSN: 1880-9413</identifier><identifier>DOI: 10.3131/jvsj.25.249</identifier><language>eng</language><publisher>The Vacuum Society of Japan</publisher><ispartof>Shinku, 1982/04/20, Vol.25(4), pp.249-252</ispartof><rights>The Vacuum Society of Japan</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3039-6e919726a9042c5eaa54add6d709cbf2e5cc2e09ea3a7f8ca5a831c760ce7043</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,4024,27923,27924,27925</link.rule.ids></links><search><creatorcontrib>YAMASHITA, Masaya</creatorcontrib><creatorcontrib>BABA, Shigeru</creatorcontrib><creatorcontrib>KINBARA, Akira</creatorcontrib><title>Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device</title><title>SHINKU</title><addtitle>J. Vac. Soc. Jpn.</addtitle><issn>0559-8516</issn><issn>1880-9413</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1982</creationdate><recordtype>article</recordtype><recordid>eNo90M1OwkAUBeCJ0USCrHyB2Zvi_LadJQERE4wmYIyryWV6C4OlkJlC4ttLBdncuzhfzuIQcs9ZX3LJH9eHuO4L3RfKXJEOz3OWGMXlNekwrU2Sa57ekl6MfsGkVIxppTvk_RUh7gNusG4i3ZZ0vvLuu8YYKdQFne32TYPB10v65bEq_klNx77aRPoR2wjobPBJR3jwDu_ITQlVxN75d8l8_DQfTpLp2_PLcDBNnGTSJCkabjKRgmFKOI0AWkFRpEXGjFuUArVzAplBkJCVuQMNueQuS5nDjCnZJQ-nWhe2MQYs7S74DYQfy5lt57DtHFZoe5zjqEcnvY4NLPFiITTeVfhnudF569X5KHOJ3QqCxVr-Amqja9U</recordid><startdate>1982</startdate><enddate>1982</enddate><creator>YAMASHITA, Masaya</creator><creator>BABA, Shigeru</creator><creator>KINBARA, Akira</creator><general>The Vacuum Society of Japan</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>1982</creationdate><title>Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device</title><author>YAMASHITA, Masaya ; BABA, Shigeru ; KINBARA, Akira</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3039-6e919726a9042c5eaa54add6d709cbf2e5cc2e09ea3a7f8ca5a831c760ce7043</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1982</creationdate><toplevel>online_resources</toplevel><creatorcontrib>YAMASHITA, Masaya</creatorcontrib><creatorcontrib>BABA, Shigeru</creatorcontrib><creatorcontrib>KINBARA, Akira</creatorcontrib><collection>CrossRef</collection><jtitle>SHINKU</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>YAMASHITA, Masaya</au><au>BABA, Shigeru</au><au>KINBARA, Akira</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device</atitle><jtitle>SHINKU</jtitle><addtitle>J. Vac. Soc. Jpn.</addtitle><date>1982</date><risdate>1982</risdate><volume>25</volume><issue>4</issue><spage>249</spage><epage>252</epage><pages>249-252</pages><issn>0559-8516</issn><eissn>1880-9413</eissn><pub>The Vacuum Society of Japan</pub><doi>10.3131/jvsj.25.249</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0559-8516
ispartof Shinku, 1982/04/20, Vol.25(4), pp.249-252
issn 0559-8516
1880-9413
language eng
recordid cdi_crossref_primary_10_3131_jvsj_25_249
source J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese
title Measurements of Thickness and Sputtering Yields of Thin Films Using a SAW Device
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T13%3A08%3A17IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-jstage_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Measurements%20of%20Thickness%20and%20Sputtering%20Yields%20of%20Thin%20Films%20Using%20a%20SAW%20Device&rft.jtitle=SHINKU&rft.au=YAMASHITA,%20Masaya&rft.date=1982&rft.volume=25&rft.issue=4&rft.spage=249&rft.epage=252&rft.pages=249-252&rft.issn=0559-8516&rft.eissn=1880-9413&rft_id=info:doi/10.3131/jvsj.25.249&rft_dat=%3Cjstage_cross%3Earticle_jvsj1958_25_4_25_4_249_article_char_en%3C/jstage_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true