Memristors based on lithium doped ZnO films

The memristor memory cell ReRAM was developed and investigated. The developed structure consists of a Schottky diode (1D) based on the ZnO:Ga/ZnO:Li/ZnO heterostructure and the memristor (1R) based on the Pt/ZnO/ZnO:Li/Al heterostructure. Thus, the unipolar memristor memory cell of 1D1R type was obt...

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Veröffentlicht in:Journal of contemporary physics 2015-07, Vol.50 (3), p.277-281
Hauptverfasser: Elbakyan, E. Y., Hovsepyan, R. K., Poghosyan, A. R.
Format: Artikel
Sprache:eng
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Zusammenfassung:The memristor memory cell ReRAM was developed and investigated. The developed structure consists of a Schottky diode (1D) based on the ZnO:Ga/ZnO:Li/ZnO heterostructure and the memristor (1R) based on the Pt/ZnO/ZnO:Li/Al heterostructure. Thus, the unipolar memristor memory cell of 1D1R type was obtained. The heterostructures were created by the vacuum electron-beam evaporation method. The laboratory samples of the memory cells were prepared and their characteristics were studied.
ISSN:1068-3372
1934-9378
DOI:10.3103/S1068337215030093