Synthesis of carbon films by magnetron sputtering of a graphite target using hydrogen as plasma-forming gas
During magnetron sputtering of graphite using hydrogen as plasma-forming gas, a material sputtered from the target deposited only on heated substrates. When using currentheated Ni-Fe foils as substrates, carbon deposits of different crystal structures were obtained. The conditions for growing single...
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| Veröffentlicht in: | Bulletin of the Lebedev Physics Institute 2011-09, Vol.38 (9), p.263-266 |
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| container_end_page | 266 |
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| container_issue | 9 |
| container_start_page | 263 |
| container_title | Bulletin of the Lebedev Physics Institute |
| container_volume | 38 |
| creator | Yurkov, A. N. Melnik, N. N. Sychev, V. V. Savranskii, V. V. Vlasov, D. V. Konov, V. I. |
| description | During magnetron sputtering of graphite using hydrogen as plasma-forming gas, a material sputtered from the target deposited only on heated substrates. When using currentheated Ni-Fe foils as substrates, carbon deposits of different crystal structures were obtained. The conditions for growing single-crystal graphite layers and single- and multilayer graphenes are found by analyzing deposits by Raman scattering. |
| doi_str_mv | 10.3103/S106833561109003X |
| format | Article |
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| ispartof | Bulletin of the Lebedev Physics Institute, 2011-09, Vol.38 (9), p.263-266 |
| issn | 1068-3356 1934-838X |
| language | eng |
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| source | SpringerLink Journals; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals |
| subjects | Physics Physics and Astronomy |
| title | Synthesis of carbon films by magnetron sputtering of a graphite target using hydrogen as plasma-forming gas |
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