Synthesis of carbon films by magnetron sputtering of a graphite target using hydrogen as plasma-forming gas

During magnetron sputtering of graphite using hydrogen as plasma-forming gas, a material sputtered from the target deposited only on heated substrates. When using currentheated Ni-Fe foils as substrates, carbon deposits of different crystal structures were obtained. The conditions for growing single-crystal graphite layers and single- and multilayer graphenes are found by analyzing deposits by Raman scattering.