HIGH TEMPERATURE STUDY OF OXYGEN DIFFUSION IN BiSrCaCuO THIN FILMS

The diffusion coefficient of oxygen in superconducting BiSrCaCuO thin films was determined in oxygen ambient in temperature range from 670K to 820K. The measurements of a diffusion coefficient were performed by potentiostatic method, employing a YSZ as a solid electrolyte. The calculations were carr...

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Veröffentlicht in:Journal of Advanced Science 1992/03/15, Vol.4(2), pp.184-187,f2
Hauptverfasser: VAITKUS, Rimantas, ASANO, Hiromitsu, SHIRAISHI, Tadashi, KOINUMA, Hideomi
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Sprache:eng
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Zusammenfassung:The diffusion coefficient of oxygen in superconducting BiSrCaCuO thin films was determined in oxygen ambient in temperature range from 670K to 820K. The measurements of a diffusion coefficient were performed by potentiostatic method, employing a YSZ as a solid electrolyte. The calculations were carried out using the data, obtained by simultaneousely monitoring the time dependences of both the current flowing along the sample and solid electrolyte as well as the electrical resistivity of thin film measured by ac four-probe method. The changes of a diffusion coefficient in the temperature region investigated are discussed.
ISSN:0915-5651
1881-3917
DOI:10.2978/jsas.4.184