Characterization of a Silicon-Micromachined Thermal Shear-Stress Sensor

A detailed characterization is presented of a silicon-micromachined thermal shear-stress sensor employing a thin-film platinum-sensing element on top of a silicon-nitride membrane that is stretched over a vacuum cavity. The sensor was operated in a constant current mode and characterized using a fou...

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Veröffentlicht in:	AIAA journal 2002-06, Vol.40 (6), p.1099-1104
Hauptverfasser:	Sheplak, Mark, Chandrasekaran, Venkataraman, Cain, Anthony, Nishida, Toshikazu, Cattafesta, Louis N
Format:	Artikel
Sprache:	eng
Schlagworte:	Aerodynamics Exact sciences and technology Fluid dynamics Fundamental areas of phenomenology (including applications) Instrumentation for fluid dynamics Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mechanical instruments, equipment and techniques Micromechanical devices and systems Physics Probes Sensitivity analysis Sensors Shear stress Silicon Silicon nitride Spectrum analysis Spurious signal noise Thermal stress Thin films
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Beschreibung
Zusammenfassung:	A detailed characterization is presented of a silicon-micromachined thermal shear-stress sensor employing a thin-film platinum-sensing element on top of a silicon-nitride membrane that is stretched over a vacuum cavity. The sensor was operated in a constant current mode and characterized using a four-point probe configuration to isolate the sensor response from the effects of external compensation circuitry.
ISSN:	0001-1452 1533-385X
DOI:	10.2514/2.1758