Tailored Glass Transition of ArF Resists for Resolution Enhancement at sub-50nm node

Tailored Glass Transition of ArF Resists for Resolution Enhancement at sub-50nm node

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Veröffentlicht in:Journal of photopolymer science and technology 2005, Vol.18 (3), p.399-406
Hauptverfasser: Takemoto, Ichiki, Fuji, Yusuke, Yoshida, Isao, Hashimoto, Kazuhiko, Miyagawa, Takayuki, Yamaguchi, Satoshi, Takahashi, Kenji, Konishi, Shinji, Lee, Youngjoon
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container_end_page 406
container_issue 3
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container_title Journal of photopolymer science and technology
container_volume 18
creator Takemoto, Ichiki
Fuji, Yusuke
Yoshida, Isao
Hashimoto, Kazuhiko
Miyagawa, Takayuki
Yamaguchi, Satoshi
Takahashi, Kenji
Konishi, Shinji
Lee, Youngjoon
description
doi_str_mv 10.2494/photopolymer.18.399
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source Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; Free Full-Text Journals in Chemistry
title Tailored Glass Transition of ArF Resists for Resolution Enhancement at sub-50nm node
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