An Apparatus for X-ray Diffraction by Oscillation Technique
A new oscillation apparatus has been developed as an X-ray diffraction technique. The apparatus is composed of two parts. The one rotates the sample around the normal of the surface, and the other oscillates within a possible range of angle around the oscillation axis; a given sample is oscillated s...
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Veröffentlicht in: | Transactions of the Japan Institute of Metals 1979, Vol.20(4), pp.181-185 |
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Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | A new oscillation apparatus has been developed as an X-ray diffraction technique. The apparatus is composed of two parts. The one rotates the sample around the normal of the surface, and the other oscillates within a possible range of angle around the oscillation axis; a given sample is oscillated simultaneously around both of the axes. The use of the apparatus allowed the accurate determination of materials with coarse grained crystals or textured grains; the maximum grain size measurable by the present method (oscillation angle, ±30°) was found to be about seventeen times (∼850 μm in size) larger than for the case without the oscillation. |
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ISSN: | 0021-4434 2432-4701 |
DOI: | 10.2320/matertrans1960.20.181 |