P-12: Novel Positive-Intrinsic-Oxide Semiconductor (P-I-OS) Photo Sensor for Flat Panel Displays
For the first time, photo sensors employing p‐type Si and IGZO semiconductor (P‐I‐OS) have been fabricated with a sensor dimension of W/L = 1600/5. The IGZO layer was deposited using DC sputtering and replaces the conventional n+‐doped cathode electrode. The P‐I‐OS photo sensor is more sensitive to...
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Veröffentlicht in: | SID International Symposium Digest of technical papers 2011-06, Vol.42 (1), p.1140-1143 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | For the first time, photo sensors employing p‐type Si and IGZO semiconductor (P‐I‐OS) have been fabricated with a sensor dimension of W/L = 1600/5. The IGZO layer was deposited using DC sputtering and replaces the conventional n+‐doped cathode electrode. The P‐I‐OS photo sensor is more sensitive to light with shorter wavelengths, and high to low photo‐current dynamic range is almost constant from −15V to −2.5V of anode bias. The P‐I‐OS photo sensor exhibits dynamic range of 53.3 dB under −5V of anode bias and 10,000 lx of illuminated light intensity |
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ISSN: | 0097-966X 2168-0159 |
DOI: | 10.1889/1.3621024 |