P-12: Novel Positive-Intrinsic-Oxide Semiconductor (P-I-OS) Photo Sensor for Flat Panel Displays

For the first time, photo sensors employing p‐type Si and IGZO semiconductor (P‐I‐OS) have been fabricated with a sensor dimension of W/L = 1600/5. The IGZO layer was deposited using DC sputtering and replaces the conventional n+‐doped cathode electrode. The P‐I‐OS photo sensor is more sensitive to...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2011-06, Vol.42 (1), p.1140-1143
Hauptverfasser: Lee, Won-Kyu, Oh, Jae Hwan, Lee, Dong Beom, Park, Yongsung, Lee, Yong Soo, Chang, Young Jin, Jin, Seong Hyun, Park, Sehoon, Choi, Min Hwan, Choi, Jae Beom, Kim, Hye Dong, Kim, Sang Soo
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Sprache:eng
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Zusammenfassung:For the first time, photo sensors employing p‐type Si and IGZO semiconductor (P‐I‐OS) have been fabricated with a sensor dimension of W/L = 1600/5. The IGZO layer was deposited using DC sputtering and replaces the conventional n+‐doped cathode electrode. The P‐I‐OS photo sensor is more sensitive to light with shorter wavelengths, and high to low photo‐current dynamic range is almost constant from −15V to −2.5V of anode bias. The P‐I‐OS photo sensor exhibits dynamic range of 53.3 dB under −5V of anode bias and 10,000 lx of illuminated light intensity
ISSN:0097-966X
2168-0159
DOI:10.1889/1.3621024