63.3: Back-exposure Manufacturing Route for MEMS Reflective Display

63.3: Back-exposure Manufacturing Route for MEMS Reflective Display

In this study, we attempted a new manufacturing route for an interferometric modulator type MEMS display. Instead of conventional pattern forming process, we developed back‐exposure procedure combined with lift‐off process to reduce the number of masks and alignment steps used. The pixel structure m...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2010-05, Vol.41 (1), p.943-945
Hauptverfasser: Park, Hyun-Chul, Oh, Jin-Ho, Choi, Hak-Nyun, Kim, Yong-Seog
Format: Artikel
Sprache:eng
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Zusammenfassung:In this study, we attempted a new manufacturing route for an interferometric modulator type MEMS display. Instead of conventional pattern forming process, we developed back‐exposure procedure combined with lift‐off process to reduce the number of masks and alignment steps used. The pixel structure manufactured revealed that this new procedure is capable of producing the device with high accuracy and quality.
ISSN:0097-966X
2168-0159
DOI:10.1889/1.3500637