30.4: Vertical Inline Deposition Technology for Full-Color OLED Production
Linear evaporation sources for substrates of up to 400 × 470 mm2 have been developed. The thermal load on the substrate during deposition has been reduced and the influence of different grain sizes has been analyzed. Automatic rate control gave stable deposition rate over three days. For full‐color...
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| Veröffentlicht in: | SID International Symposium Digest of technical papers 2005-05, Vol.36 (1), p.1204-1207 |
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| Hauptverfasser: | , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | Linear evaporation sources for substrates of up to 400 × 470 mm2 have been developed. The thermal load on the substrate during deposition has been reduced and the influence of different grain sizes has been analyzed. Automatic rate control gave stable deposition rate over three days. For full‐color OLED production a mask alignment system for the vertical inline deposition technology has been developed. The system handles substrate sizes of 370×470 mm2 and achieves a precision of better than +/− 5 μm. Mask cleaning is carried out in vacuum for long mask life and process stability. |
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| ISSN: | 0097-966X 2168-0159 |
| DOI: | 10.1889/1.2036218 |