High Power Excimer Laser for Low Temperature Poly-Si Annealing

Poly‐silicon TFT panels for active matrix LCD displays can be manufactured cost effectively and with high quality by low temperature excimer laser annealing. While display manufacturers are adopting this process for mass production, the demands for the laser properties, such as homogeneity, pulse‐to‐pulse stability and reliability are further extended. To meet these demands there are ongoing improvements of the laser source and the optical system. This paper presents latest optimization results of the LAMBDA excimer laser and the MICROLAS Line Beam Optics for large area panel manufacturing.