40.4: Optimization of Light-Valve Mirrors

A mirror structure for reflective Si based light valves was fabricated using chemical mechanical polishing and a thin 150 nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical‐mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5–40 μm and 0.7 or 0.5 μm gaps were measured and the performance of TN LC pixels with different sizes and inversion methods are reported.