P‐22: Qualification of LCD Grade NF 3 for PECVD Chamber Cleaning
LCD grade NF 3 gas, which has lower purity, was evaluated for chamber cleaning in a PECVD system for TFT‐LCD manufacturing. This paper presents a comparison of performance criteria: deposited film properties, cleaning rate, in‐film contamination analysis (SIMS and TXRF) and deposition and clean repe...
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| Veröffentlicht in: | SID International Symposium Digest of technical papers 2000-05, Vol.31 (1), p.608-611 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | LCD grade NF
3
gas, which has lower purity, was evaluated for chamber cleaning in a PECVD system for TFT‐LCD manufacturing. This paper presents a comparison of performance criteria: deposited film properties, cleaning rate, in‐film contamination analysis (SIMS and TXRF) and deposition and clean repeatability for LCD‐grade and ULSI‐grade of NF
3
. |
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| ISSN: | 0097-966X 2168-0159 |
| DOI: | 10.1889/1.1833019 |