LP-9: Late News Poster: Patterned Alignment Layers Using Holographic Exposure Technique

LP-9: Late News Poster: Patterned Alignment Layers Using Holographic Exposure Technique

We present a novel method to create patterned alignment layers using holography with a photopolymerizable layer, and show the various types of alignments that are possible. The technique is very flexible and can create a rich variety of new configurations, not possible with conventional lithograph p...

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Veröffentlicht in:SID International Symposium Digest of technical papers 2004-05, Vol.35 (1), p.578-581
Hauptverfasser: Eakin, James N., Xie, Yunhe, Pelcovits, Robert A., Crawford, Gregory P., Radcliffe, Marc D.
Format: Artikel
Sprache:eng
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Beschreibung
Zusammenfassung:We present a novel method to create patterned alignment layers using holography with a photopolymerizable layer, and show the various types of alignments that are possible. The technique is very flexible and can create a rich variety of new configurations, not possible with conventional lithograph patterning techniques.
ISSN:0097-966X
2168-0159
DOI:10.1889/1.1831044