Investigation of Thickness Effect on Structural and Magnetic Properties of Ni Thin Films for Some Applications

In this study, it was investigated the effect on the structural, and magnetic properties dependent on the thickness of the Nickel films grown on MgO (100) substrates by the molecular beam epitaxy at a high vacuum. The structural and magnetic properties were examined by using X-ray diffraction and ferromagnetic resonance techniques. The X-ray diffraction and X-ray reflectivity measurements showed that Ni films grew in (200) orientation with tiny surface roughness. Experimental ferromagnetic resonance data showed that all samples had in-plane easy axis from out-of-plane measurements and fourfold anisotropy from in-plane measurements. Additionally, conditions under which Ni/MgO (100) films grew epitaxially were also observed. In this study, where the minimum thickness required for some applications to exhibit both magnetic properties and form the crystal structure of Ni thin films is determined, the importance of film thickness in terms of applications is emphasized and the minimum thickness condition is determined in terms of some applications.