Millimeter-Wave GaN HEMT for Power Amplifier Applications

Gallium nitride high electron mobility transistors (GaN HEMTs) were developed for millimeter-wave high power amplifier applications. The device with a gate length of 80 nm and an InAlN barrier layer exhibited high drain current of more than 1.2 A/mm and high breakdown voltage of 73 V. A cut-off freq...

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Veröffentlicht in:IEICE Transactions on Electronics 2014/10/01, Vol.E97.C(10), pp.923-929
Hauptverfasser: JOSHIN, Kazukiyo, MAKIYAMA, Kozo, OZAKI, Shiro, OHKI, Toshihiro, OKAMOTO, Naoya, NIIDA, Yoshitaka, SATO, Masaru, MASUDA, Satoshi, WATANABE, Keiji
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Sprache:eng
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Zusammenfassung:Gallium nitride high electron mobility transistors (GaN HEMTs) were developed for millimeter-wave high power amplifier applications. The device with a gate length of 80 nm and an InAlN barrier layer exhibited high drain current of more than 1.2 A/mm and high breakdown voltage of 73 V. A cut-off frequency fT of 113 GHz and maximum oscillation frequency fmax of 230 GHz were achieved. The output power density reached 1 W/mm with a linear gain of 6.4 dB at load-pull measurements at 90 GHz. And we extracted equivalent circuit model parameters of the millimeter-wave InAlN/GaN HEMT and showed that the model was useful in simulating the millimeter-wave power performance. Also, we report a preliminary constant bias stress test result.
ISSN:0916-8524
1745-1353
DOI:10.1587/transele.E97.C.923