Atomic and molecular layer deposition in pursuing better batteries

In the past decade, atomic and molecular layer deposition (ALD and MLD), these two sister techniques have been attracting more and more research attention to address technical challenges in various advanced battery systems. The charm of both ALD and MLD lies in their unique mechanism for growing a l...

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Veröffentlicht in:Journal of materials research 2020-07, p.1-24
1. Verfasser: Meng, Xiangbo
Format: Artikel
Sprache:eng
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Zusammenfassung:In the past decade, atomic and molecular layer deposition (ALD and MLD), these two sister techniques have been attracting more and more research attention to address technical challenges in various advanced battery systems. The charm of both ALD and MLD lies in their unique mechanism for growing a large variety of functional materials, featuring uniform and conformal films enabled at the atomic/molecular level at low temperature. Using ALD and MLD, to date, there have been many excitements achieved in research. These will ultimately be reflected on technical innovations that will help revolutionize our lifestyles. This invited article gives the first comprehensive review briefing on the journey of ALD and MLD in pursuing better batteries and highlighting many exciting progresses in various advanced battery systems. It is expected that this review will help boost many more efforts in using ALD and MLD for new battery technologies in the coming decade.
ISSN:0884-2914
2044-5326
DOI:10.1557/jmr.2020.173