Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography
We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the s...
Gespeichert in:
Veröffentlicht in: | IEEJ Transactions on Sensors and Micromachines 2000/07/01, Vol.120(7), pp.363-369 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 369 |
---|---|
container_issue | 7 |
container_start_page | 363 |
container_title | IEEJ Transactions on Sensors and Micromachines |
container_volume | 120 |
creator | Haga, Tsuyoshi Okuyama, Hiroshi Hirata, Yoshihiro Takada, Hiroshi |
description | We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the substrate of the microconnector and have high aspect ratios. These structures are fabricated using the LIGA-like process. The cantilever shape terminals as moving structures (7-μm-width, 80-μm-height and 300-μm-length) were fabricated using the one-layer sacrificial process. The tapered terminals and guides for the smooth connection were fabricated by micro-electro-discharge-machining combined with the LIGA-like process. We confirmed the electrical cronnection at 160mA/line and the automatic connection (disconnection) at a distance of 600-μm between opposing microconnectors. |
doi_str_mv | 10.1541/ieejsmas.120.363 |
format | Article |
fullrecord | <record><control><sourceid>jstage_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1541_ieejsmas_120_363</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>article_ieejsmas1995_120_7_120_7_363_article_char_en</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3243-36b41b998aca237298254421bd89012ea5d459a56b921e8d42f02c9d648d84fb3</originalsourceid><addsrcrecordid>eNp9kMlOwzAQhi0EEqVw5-gXSPGa2kdoWVXEhUrcoonjNK5SJ7ItpL496UIPHLjMjDT_N8uP0C0lEyoFvXPWruMG4oQyMuE5P0MjysU0k5LJ831NM6W5vkRXMa4JyZVmYoRgbr9t2_Ub6xPuavzuTOhM5701qQsRL6PzK8zx3A2K6DoP7UGzAdM4v2s-QLQV7jyeW9vjryzAFi9carpVgL7ZXqOLGtpob455jJZPj5-zl2zx8fw6u19khjPBM56XgpZaKzDA-JRpxaQQjJaV0oQyC7ISUoPMS82oVZVgNWFGV7lQlRJ1yceIHOYOx8UYbF30wW0gbAtKip1Fxa9FxWBRMVg0IPkfxLgEafgyBXDtf-DbAVzHBCt72gQhOdPaE0C1lntoeowDfBKZBkJhPf8BJfmJbQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography</title><source>Alma/SFX Local Collection</source><creator>Haga, Tsuyoshi ; Okuyama, Hiroshi ; Hirata, Yoshihiro ; Takada, Hiroshi</creator><creatorcontrib>Haga, Tsuyoshi ; Okuyama, Hiroshi ; Hirata, Yoshihiro ; Takada, Hiroshi</creatorcontrib><description>We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the substrate of the microconnector and have high aspect ratios. These structures are fabricated using the LIGA-like process. The cantilever shape terminals as moving structures (7-μm-width, 80-μm-height and 300-μm-length) were fabricated using the one-layer sacrificial process. The tapered terminals and guides for the smooth connection were fabricated by micro-electro-discharge-machining combined with the LIGA-like process. We confirmed the electrical cronnection at 160mA/line and the automatic connection (disconnection) at a distance of 600-μm between opposing microconnectors.</description><identifier>ISSN: 1341-8939</identifier><identifier>EISSN: 1347-5525</identifier><identifier>DOI: 10.1541/ieejsmas.120.363</identifier><language>eng</language><publisher>The Institute of Electrical Engineers of Japan</publisher><ispartof>IEEJ Transactions on Sensors and Micromachines, 2000/07/01, Vol.120(7), pp.363-369</ispartof><rights>The Institute of Electrical Engineers of Japan</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3243-36b41b998aca237298254421bd89012ea5d459a56b921e8d42f02c9d648d84fb3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,4024,27923,27924,27925</link.rule.ids></links><search><creatorcontrib>Haga, Tsuyoshi</creatorcontrib><creatorcontrib>Okuyama, Hiroshi</creatorcontrib><creatorcontrib>Hirata, Yoshihiro</creatorcontrib><creatorcontrib>Takada, Hiroshi</creatorcontrib><title>Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography</title><title>IEEJ Transactions on Sensors and Micromachines</title><addtitle>IEEJ Trans. SM</addtitle><description>We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the substrate of the microconnector and have high aspect ratios. These structures are fabricated using the LIGA-like process. The cantilever shape terminals as moving structures (7-μm-width, 80-μm-height and 300-μm-length) were fabricated using the one-layer sacrificial process. The tapered terminals and guides for the smooth connection were fabricated by micro-electro-discharge-machining combined with the LIGA-like process. We confirmed the electrical cronnection at 160mA/line and the automatic connection (disconnection) at a distance of 600-μm between opposing microconnectors.</description><issn>1341-8939</issn><issn>1347-5525</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2000</creationdate><recordtype>article</recordtype><recordid>eNp9kMlOwzAQhi0EEqVw5-gXSPGa2kdoWVXEhUrcoonjNK5SJ7ItpL496UIPHLjMjDT_N8uP0C0lEyoFvXPWruMG4oQyMuE5P0MjysU0k5LJ831NM6W5vkRXMa4JyZVmYoRgbr9t2_Ub6xPuavzuTOhM5701qQsRL6PzK8zx3A2K6DoP7UGzAdM4v2s-QLQV7jyeW9vjryzAFi9carpVgL7ZXqOLGtpob455jJZPj5-zl2zx8fw6u19khjPBM56XgpZaKzDA-JRpxaQQjJaV0oQyC7ISUoPMS82oVZVgNWFGV7lQlRJ1yceIHOYOx8UYbF30wW0gbAtKip1Fxa9FxWBRMVg0IPkfxLgEafgyBXDtf-DbAVzHBCt72gQhOdPaE0C1lntoeowDfBKZBkJhPf8BJfmJbQ</recordid><startdate>2000</startdate><enddate>2000</enddate><creator>Haga, Tsuyoshi</creator><creator>Okuyama, Hiroshi</creator><creator>Hirata, Yoshihiro</creator><creator>Takada, Hiroshi</creator><general>The Institute of Electrical Engineers of Japan</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2000</creationdate><title>Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography</title><author>Haga, Tsuyoshi ; Okuyama, Hiroshi ; Hirata, Yoshihiro ; Takada, Hiroshi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3243-36b41b998aca237298254421bd89012ea5d459a56b921e8d42f02c9d648d84fb3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2000</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Haga, Tsuyoshi</creatorcontrib><creatorcontrib>Okuyama, Hiroshi</creatorcontrib><creatorcontrib>Hirata, Yoshihiro</creatorcontrib><creatorcontrib>Takada, Hiroshi</creatorcontrib><collection>CrossRef</collection><jtitle>IEEJ Transactions on Sensors and Micromachines</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Haga, Tsuyoshi</au><au>Okuyama, Hiroshi</au><au>Hirata, Yoshihiro</au><au>Takada, Hiroshi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography</atitle><jtitle>IEEJ Transactions on Sensors and Micromachines</jtitle><addtitle>IEEJ Trans. SM</addtitle><date>2000</date><risdate>2000</risdate><volume>120</volume><issue>7</issue><spage>363</spage><epage>369</epage><pages>363-369</pages><artnum>363</artnum><issn>1341-8939</issn><eissn>1347-5525</eissn><abstract>We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the substrate of the microconnector and have high aspect ratios. These structures are fabricated using the LIGA-like process. The cantilever shape terminals as moving structures (7-μm-width, 80-μm-height and 300-μm-length) were fabricated using the one-layer sacrificial process. The tapered terminals and guides for the smooth connection were fabricated by micro-electro-discharge-machining combined with the LIGA-like process. We confirmed the electrical cronnection at 160mA/line and the automatic connection (disconnection) at a distance of 600-μm between opposing microconnectors.</abstract><pub>The Institute of Electrical Engineers of Japan</pub><doi>10.1541/ieejsmas.120.363</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1341-8939 |
ispartof | IEEJ Transactions on Sensors and Micromachines, 2000/07/01, Vol.120(7), pp.363-369 |
issn | 1341-8939 1347-5525 |
language | eng |
recordid | cdi_crossref_primary_10_1541_ieejsmas_120_363 |
source | Alma/SFX Local Collection |
title | Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-08T05%3A20%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-jstage_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Development%20of%20Microconnectors%20Using%203%20Dimensional%20Micromachining%20Based%20on%20Deep%20X-ray%20Lithography&rft.jtitle=IEEJ%20Transactions%20on%20Sensors%20and%20Micromachines&rft.au=Haga,%20Tsuyoshi&rft.date=2000&rft.volume=120&rft.issue=7&rft.spage=363&rft.epage=369&rft.pages=363-369&rft.artnum=363&rft.issn=1341-8939&rft.eissn=1347-5525&rft_id=info:doi/10.1541/ieejsmas.120.363&rft_dat=%3Cjstage_cross%3Earticle_ieejsmas1995_120_7_120_7_363_article_char_en%3C/jstage_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |