Development of Microconnectors Using 3 Dimensional Micromachining Based on Deep X-ray Lithography

We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the s...

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Veröffentlicht in:IEEJ Transactions on Sensors and Micromachines 2000/07/01, Vol.120(7), pp.363-369
Hauptverfasser: Haga, Tsuyoshi, Okuyama, Hiroshi, Hirata, Yoshihiro, Takada, Hiroshi
Format: Artikel
Sprache:eng
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Zusammenfassung:We have developed a microconnector with an automatic connecting/disconnecting mechanism employing magnetic force. The diameter and thickness of the microconnector is 2.5-mm and 2-mm, respectively. To obtain a large area and reliable connection, the terminals and guides must be perpendicular to the substrate of the microconnector and have high aspect ratios. These structures are fabricated using the LIGA-like process. The cantilever shape terminals as moving structures (7-μm-width, 80-μm-height and 300-μm-length) were fabricated using the one-layer sacrificial process. The tapered terminals and guides for the smooth connection were fabricated by micro-electro-discharge-machining combined with the LIGA-like process. We confirmed the electrical cronnection at 160mA/line and the automatic connection (disconnection) at a distance of 600-μm between opposing microconnectors.
ISSN:1341-8939
1347-5525
DOI:10.1541/ieejsmas.120.363