Surface Processing of PTFE using Discharge under High E/n Condition: Chemical Stability of Processed Surface
Surface processing of PTFE (Polytetrafluoroethylene) using high E/n discharge in nitrogen rich condition was carried out. In the paper, to know a kind of introduced polar groups and chemical stability of the surface by the processing, the sample was rinsed with the water and the water was analyzed b...
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Veröffentlicht in: | Denki Gakkai ronbunshi. A, Kiso zairyÅ 2002, Vol.122(8), pp.742-747 |
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Format: | Artikel |
Sprache: | eng ; jpn |
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Zusammenfassung: | Surface processing of PTFE (Polytetrafluoroethylene) using high E/n discharge in nitrogen rich condition was carried out. In the paper, to know a kind of introduced polar groups and chemical stability of the surface by the processing, the sample was rinsed with the water and the water was analyzed by FT-IR (Fourier transform infrared spectroscopy) and measured pH. Further, to know a chemical change by the rinse, depth profile was carried out using angle-resolved XPS (X-ray photoelectron spectroscopy). From the results, many polar groups including oxygen and nitrogen were introduced on the surface. pH of the water decreased and polar groups such as -NO2 and -COOH were detected in the water. Surface energy and component were changed a little by the rinse. It was suggested that the processing is able to increase surface energy with chemical stability. |
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ISSN: | 0385-4205 1347-5533 |
DOI: | 10.1541/ieejfms.122.742 |