Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition
The plasma was generated in organic solvents (ethanol and n-hexane mixture) in order to coating inside the narrow tubes. From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to...
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| Veröffentlicht in: | Transactions of the Materials Research Society of Japan 2010/09/01, Vol.35(3), pp.567-570 |
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| container_issue | 3 |
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| container_title | Transactions of the Materials Research Society of Japan |
| container_volume | 35 |
| creator | Shinohara, Masanori Zhang, Shuai Kotani, Kenji Akaki, Kazuhiko Matsuda, Yoshinobu Fujiyama, Hiroshi |
| description | The plasma was generated in organic solvents (ethanol and n-hexane mixture) in order to coating inside the narrow tubes. From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to film deposition, since ethanol is used for plasma generation and hexane is used for source of the films. FTIR spectra exhibited the deposited films are typically polymer-like amorphous carbon (PLC) films. |
| doi_str_mv | 10.14723/tmrsj.35.567 |
| format | Article |
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From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to film deposition, since ethanol is used for plasma generation and hexane is used for source of the films. FTIR spectra exhibited the deposited films are typically polymer-like amorphous carbon (PLC) films.</description><identifier>ISSN: 1382-3469</identifier><identifier>EISSN: 2188-1650</identifier><identifier>DOI: 10.14723/tmrsj.35.567</identifier><language>eng</language><publisher>The Materials Research Society of Japan</publisher><subject>amorphous carbon ; discharge current ; organic solvent ; plasma</subject><ispartof>Transactions of the Materials Research Society of Japan, 2010/09/01, Vol.35(3), pp.567-570</ispartof><rights>2010 The Materials Research Society of Japan</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3447-2fd62f0b1e20ec41988e1bcd8bcbc9897323f77a4c23482636f79bfb1a80a1ea3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4009,27902,27903,27904</link.rule.ids></links><search><creatorcontrib>Shinohara, Masanori</creatorcontrib><creatorcontrib>Zhang, Shuai</creatorcontrib><creatorcontrib>Kotani, Kenji</creatorcontrib><creatorcontrib>Akaki, Kazuhiko</creatorcontrib><creatorcontrib>Matsuda, Yoshinobu</creatorcontrib><creatorcontrib>Fujiyama, Hiroshi</creatorcontrib><title>Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition</title><title>Transactions of the Materials Research Society of Japan</title><addtitle>Trans. Mat. Res. Soc. Japan</addtitle><description>The plasma was generated in organic solvents (ethanol and n-hexane mixture) in order to coating inside the narrow tubes. From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to film deposition, since ethanol is used for plasma generation and hexane is used for source of the films. 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| ispartof | Transactions of the Materials Research Society of Japan, 2010/09/01, Vol.35(3), pp.567-570 |
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| subjects | amorphous carbon discharge current organic solvent plasma |
| title | Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition |
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