Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition

Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition

The plasma was generated in organic solvents (ethanol and n-hexane mixture) in order to coating inside the narrow tubes. From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to...

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Veröffentlicht in:Transactions of the Materials Research Society of Japan 2010/09/01, Vol.35(3), pp.567-570
Hauptverfasser: Shinohara, Masanori, Zhang, Shuai, Kotani, Kenji, Akaki, Kazuhiko, Matsuda, Yoshinobu, Fujiyama, Hiroshi
Format: Artikel
Sprache:eng
Schlagworte:
amorphous carbon
discharge current
organic solvent
plasma
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Zusammenfassung:The plasma was generated in organic solvents (ethanol and n-hexane mixture) in order to coating inside the narrow tubes. From measurements of discharge current, plasma is easily generated in ethanol, but the generation of plasma has difficulty in n-hexane. The ratio of mixture of 1:1 is suitable to film deposition, since ethanol is used for plasma generation and hexane is used for source of the films. FTIR spectra exhibited the deposited films are typically polymer-like amorphous carbon (PLC) films.
ISSN:1382-3469
2188-1650
DOI:10.14723/tmrsj.35.567