Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation
Several oblique cutting methods, including a recently developed gradient shaving preparation, for sample pretreatments have been developed. The combination of the above pretreatment method and time-of-flight secondary ion mass spectrometry provides very useful depth-profiling information in the an...
Gespeichert in:
Veröffentlicht in: | Journal of Surface Analysis 2009, Vol.15(3), pp.235-238 |
---|---|
1. Verfasser: | |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | 238 |
---|---|
container_issue | 3 |
container_start_page | 235 |
container_title | Journal of Surface Analysis |
container_volume | 15 |
creator | Itoh, Hiroto |
description | Several oblique cutting methods, including a recently developed gradient shaving preparation, for sample pretreatments have been developed. The combination of the above pretreatment method and time-of-flight secondary ion mass spectrometry provides very useful depth-profiling information in the analysis of organic materials for practical use. In this report, some results measured by combinations of the several oblique cutting methods and ToF-SIMS measurements are introduced. |
doi_str_mv | 10.1384/jsa.15.235 |
format | Article |
fullrecord | <record><control><sourceid>jstage_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1384_jsa_15_235</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>article_jsa_15_3_15_235_article_char_en</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2970-9336e4a6c927ba2d98db5c7c797aafb4bcf59135d3aa1a7b4100378c91ed82753</originalsourceid><addsrcrecordid>eNo90MFOAjEQBuDGaCKiF5-gZ5PFdttutwcPBAVJIJAA5zrb7ULJ2iXtxoS3dxHkNJOZb-bwI_RMyYCynL_uIwyoGKRM3KAeZVwmOSfk9q-nCZUiu0cPMe4JyTIpeA99vdtDu8PL0FSudn6Lhx7qY3QRNxVehC14Z_AcWhsc1BEXR7yJJ7ZuxslqOl9h8CWeBCid9S1e7eDntF0Ge4AArWv8I7qrukv7dKl9tBl_rEefyWwxmY6Gs8SkSpJEMZZZDplRqSwgLVVeFsJII5UEqApemEooykTJACjIglNCmMyNorbMUylYH72c_5rQxBhspQ_BfUM4akr0KRvdZaOp0F02HX47431sYWuvFELrTG3_Kbv469zsIGjr2S_9uW3V</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation</title><source>J-STAGE Free</source><source>Free Full-Text Journals in Chemistry</source><creator>Itoh, Hiroto</creator><creatorcontrib>Itoh, Hiroto</creatorcontrib><description> Several oblique cutting methods, including a recently developed gradient shaving preparation, for sample pretreatments have been developed. The combination of the above pretreatment method and time-of-flight secondary ion mass spectrometry provides very useful depth-profiling information in the analysis of organic materials for practical use. In this report, some results measured by combinations of the several oblique cutting methods and ToF-SIMS measurements are introduced.</description><identifier>ISSN: 1341-1756</identifier><identifier>EISSN: 1347-8400</identifier><identifier>DOI: 10.1384/jsa.15.235</identifier><language>eng</language><publisher>The Surface Analysis Society of Japan</publisher><ispartof>Journal of Surface Analysis, 2009, Vol.15(3), pp.235-238</ispartof><rights>2009 The Surface Analysis Society of Japan</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2970-9336e4a6c927ba2d98db5c7c797aafb4bcf59135d3aa1a7b4100378c91ed82753</citedby><cites>FETCH-LOGICAL-c2970-9336e4a6c927ba2d98db5c7c797aafb4bcf59135d3aa1a7b4100378c91ed82753</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,1883,4024,27923,27924,27925</link.rule.ids></links><search><creatorcontrib>Itoh, Hiroto</creatorcontrib><title>Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation</title><title>Journal of Surface Analysis</title><description> Several oblique cutting methods, including a recently developed gradient shaving preparation, for sample pretreatments have been developed. The combination of the above pretreatment method and time-of-flight secondary ion mass spectrometry provides very useful depth-profiling information in the analysis of organic materials for practical use. In this report, some results measured by combinations of the several oblique cutting methods and ToF-SIMS measurements are introduced.</description><issn>1341-1756</issn><issn>1347-8400</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNo90MFOAjEQBuDGaCKiF5-gZ5PFdttutwcPBAVJIJAA5zrb7ULJ2iXtxoS3dxHkNJOZb-bwI_RMyYCynL_uIwyoGKRM3KAeZVwmOSfk9q-nCZUiu0cPMe4JyTIpeA99vdtDu8PL0FSudn6Lhx7qY3QRNxVehC14Z_AcWhsc1BEXR7yJJ7ZuxslqOl9h8CWeBCid9S1e7eDntF0Ge4AArWv8I7qrukv7dKl9tBl_rEefyWwxmY6Gs8SkSpJEMZZZDplRqSwgLVVeFsJII5UEqApemEooykTJACjIglNCmMyNorbMUylYH72c_5rQxBhspQ_BfUM4akr0KRvdZaOp0F02HX47431sYWuvFELrTG3_Kbv469zsIGjr2S_9uW3V</recordid><startdate>2009</startdate><enddate>2009</enddate><creator>Itoh, Hiroto</creator><general>The Surface Analysis Society of Japan</general><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>2009</creationdate><title>Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation</title><author>Itoh, Hiroto</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2970-9336e4a6c927ba2d98db5c7c797aafb4bcf59135d3aa1a7b4100378c91ed82753</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Itoh, Hiroto</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of Surface Analysis</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Itoh, Hiroto</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation</atitle><jtitle>Journal of Surface Analysis</jtitle><date>2009</date><risdate>2009</risdate><volume>15</volume><issue>3</issue><spage>235</spage><epage>238</epage><pages>235-238</pages><issn>1341-1756</issn><eissn>1347-8400</eissn><abstract> Several oblique cutting methods, including a recently developed gradient shaving preparation, for sample pretreatments have been developed. The combination of the above pretreatment method and time-of-flight secondary ion mass spectrometry provides very useful depth-profiling information in the analysis of organic materials for practical use. In this report, some results measured by combinations of the several oblique cutting methods and ToF-SIMS measurements are introduced.</abstract><pub>The Surface Analysis Society of Japan</pub><doi>10.1384/jsa.15.235</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1341-1756 |
ispartof | Journal of Surface Analysis, 2009, Vol.15(3), pp.235-238 |
issn | 1341-1756 1347-8400 |
language | eng |
recordid | cdi_crossref_primary_10_1384_jsa_15_235 |
source | J-STAGE Free; Free Full-Text Journals in Chemistry |
title | Depth Profiling Analysis of Organic Materials by Using ToF-SIMS and Gradient Shaving Preparation |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T09%3A46%3A19IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-jstage_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Depth%20Profiling%20Analysis%20of%20Organic%20Materials%20by%20Using%20ToF-SIMS%20and%20Gradient%20Shaving%20Preparation&rft.jtitle=Journal%20of%20Surface%20Analysis&rft.au=Itoh,%20Hiroto&rft.date=2009&rft.volume=15&rft.issue=3&rft.spage=235&rft.epage=238&rft.pages=235-238&rft.issn=1341-1756&rft.eissn=1347-8400&rft_id=info:doi/10.1384/jsa.15.235&rft_dat=%3Cjstage_cross%3Earticle_jsa_15_3_15_235_article_char_en%3C/jstage_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |