Development of a Nb Sputtering Method for the Coating of a Cu Cavity
We have developed a DC magnetron sputtering apparatus for the coating of Nb films on the inner surfaces of a 500 MHz Cu cavity. Q0 values at 4.2 K by pipe cooling have been determined in order to optimize the various coating processes. The Nb films can be sputtered successively after sputter-cleanin...
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| Veröffentlicht in: | Hyomen Kagaku 1994/04/20, Vol.15(3), pp.181-183 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | We have developed a DC magnetron sputtering apparatus for the coating of Nb films on the inner surfaces of a 500 MHz Cu cavity. Q0 values at 4.2 K by pipe cooling have been determined in order to optimize the various coating processes. The Nb films can be sputtered successively after sputter-cleaning the inner surfaces of the cavity by switching the polarity of the DC power supply operated at a constant power. |
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| ISSN: | 0388-5321 1881-4743 |
| DOI: | 10.1380/jsssj.15.181 |