Comparative study of SiO_2, Si_3N_4 and TiO_2 thin films as passivation layers for quantum cascade lasers

Comparative study of SiO_2, Si_3N_4 and TiO_2 thin films as passivation layers for quantum cascade lasers

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Veröffentlicht in:Optics express 2016-10, Vol.24 (21), p.24032
Hauptverfasser: Ferré, Simon, Peinado, Alba, Garcia-Caurel, Enric, Trinité, Virginie, Carras, Mathieu, Ferreira, Robson
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container_issue 21
container_start_page 24032
container_title Optics express
container_volume 24
creator Ferré, Simon
Peinado, Alba
Garcia-Caurel, Enric
Trinité, Virginie
Carras, Mathieu
Ferreira, Robson
description
doi_str_mv 10.1364/OE.24.024032
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title Comparative study of SiO_2, Si_3N_4 and TiO_2 thin films as passivation layers for quantum cascade lasers
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