Beyond the diffraction limit with a quantum confinement effect (QCE) image sensor
The quantum confinement effect was successfully applied in quantum optical lithography to pattern structures in 1–10 nm domain. In this paper, the breakdown of the light diffraction limit was extended to optical instruments (telescope and microscope). Optical writing of the QCE image sensor was real...
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Veröffentlicht in: | Journal of the Optical Society of America. B, Optical physics Optical physics, 2024-03, Vol.41 (3), p.566 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The quantum confinement effect was successfully applied in quantum optical lithography
to pattern structures in 1–10 nm domain. In this paper, the
breakdown of the light diffraction limit was extended to optical
instruments (telescope and microscope). Optical writing of the QCE
image sensor was realized at a resolution of 60 nm. The novel,
to the best of our knowledge, type of the 1GPixel image sensor has
potential applications in (i) astronomy (angular resolution increases ∼240× at F/D = 24), and (ii)
optical microscopy (resolution ∼8nm at 660 nm). An optical
microscope with atomic resolution is proposed. Exceeding the light
diffraction limit, the theoretical growth of the angular resolution of
the telescope could attain an amplification factor of ∼14,000×. |
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ISSN: | 0740-3224 1520-8540 |
DOI: | 10.1364/JOSAB.505446 |