Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold
Gespeichert in:
| Veröffentlicht in: | Journal of the Optical Society of America. B, Optical physics Optical physics, 2018-11, Vol.35 (11), p.2799 |
|---|---|
| Hauptverfasser: | , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 11 |
| container_start_page | 2799 |
| container_title | Journal of the Optical Society of America. B, Optical physics |
| container_volume | 35 |
| creator | Makhotkin, Igor A. Milov, Igor Chalupský, Jaromir Tiedtke, Kai Enkisch, Hartmut de Vries, Gosse Scholze, Frank Siewert, Frank Sturm, Jacobus M. Nikolaev, Konstantin V. van de Kruijs, Robbert W. E. Smithers, Mark A. van Wolferen, Henk A. G. M. Keim, Enrico G. Louis, Eric Jacyna, Iwanna Jurek, Marek Klinger, Dorota Pelka, Jerzy B. Juha, Libor Hájková, Věra Vozda, Vojtěch Burian, Tomáš Saksl, Karel Faatz, Bart Keitel, Barbara Plönjes, Elke Schreiber, Siegfried Toleikis, Sven Loch, Rolf Hermann, Martin Strobel, Sebastian Donker, Rilpho Mey, Tobias Sobierajski, Ryszard |
| description | |
| doi_str_mv | 10.1364/JOSAB.35.002799 |
| format | Article |
| fullrecord | <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1364_JOSAB_35_002799</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1364_JOSAB_35_002799</sourcerecordid><originalsourceid>FETCH-LOGICAL-c348t-4a0020cc77407f24a1a8c759c148e38cdad2db62f7158cb3236b37a144cabb933</originalsourceid><addsrcrecordid>eNotkMtOwzAURC0EEqWwZusfSOtXmmRZyluVuoAidpHt3DRGSRz5AfQj-GcC7WauNNKd0RyErimZUb4Q8-fNy_JmxtMZISwrihM0oSkjSZ4KcoomJBMk4YyJc3Th_QchRBDGJujnVnZyB1hqHbvYymBsj02PQzOKi6GB3sQO16bt_OhXUUOF1R47GCCYYD4Bw_dgfXSAg8U1dMF60Lav8Pv2DQ-x9eCxgtZ-jZmAvel3LSS-sQFLdewLjYPRaatLdFbL8ePqeKdoe3_3unpM1puHp9VynWgu8pAIOW4kWmfjqKxmQlKZ6ywtNBU58FxXsmKVWrA6o2muFWd8oXgmqRBaKlVwPkXzQ6521nsHdTk400m3Lykp_2iW_zRLnpYHmvwXxE9r-A</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold</title><source>Optica Publishing Group Journals</source><creator>Makhotkin, Igor A. ; Milov, Igor ; Chalupský, Jaromir ; Tiedtke, Kai ; Enkisch, Hartmut ; de Vries, Gosse ; Scholze, Frank ; Siewert, Frank ; Sturm, Jacobus M. ; Nikolaev, Konstantin V. ; van de Kruijs, Robbert W. E. ; Smithers, Mark A. ; van Wolferen, Henk A. G. M. ; Keim, Enrico G. ; Louis, Eric ; Jacyna, Iwanna ; Jurek, Marek ; Klinger, Dorota ; Pelka, Jerzy B. ; Juha, Libor ; Hájková, Věra ; Vozda, Vojtěch ; Burian, Tomáš ; Saksl, Karel ; Faatz, Bart ; Keitel, Barbara ; Plönjes, Elke ; Schreiber, Siegfried ; Toleikis, Sven ; Loch, Rolf ; Hermann, Martin ; Strobel, Sebastian ; Donker, Rilpho ; Mey, Tobias ; Sobierajski, Ryszard</creator><creatorcontrib>Makhotkin, Igor A. ; Milov, Igor ; Chalupský, Jaromir ; Tiedtke, Kai ; Enkisch, Hartmut ; de Vries, Gosse ; Scholze, Frank ; Siewert, Frank ; Sturm, Jacobus M. ; Nikolaev, Konstantin V. ; van de Kruijs, Robbert W. E. ; Smithers, Mark A. ; van Wolferen, Henk A. G. M. ; Keim, Enrico G. ; Louis, Eric ; Jacyna, Iwanna ; Jurek, Marek ; Klinger, Dorota ; Pelka, Jerzy B. ; Juha, Libor ; Hájková, Věra ; Vozda, Vojtěch ; Burian, Tomáš ; Saksl, Karel ; Faatz, Bart ; Keitel, Barbara ; Plönjes, Elke ; Schreiber, Siegfried ; Toleikis, Sven ; Loch, Rolf ; Hermann, Martin ; Strobel, Sebastian ; Donker, Rilpho ; Mey, Tobias ; Sobierajski, Ryszard</creatorcontrib><identifier>ISSN: 0740-3224</identifier><identifier>EISSN: 1520-8540</identifier><identifier>DOI: 10.1364/JOSAB.35.002799</identifier><language>eng</language><ispartof>Journal of the Optical Society of America. B, Optical physics, 2018-11, Vol.35 (11), p.2799</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c348t-4a0020cc77407f24a1a8c759c148e38cdad2db62f7158cb3236b37a144cabb933</citedby><cites>FETCH-LOGICAL-c348t-4a0020cc77407f24a1a8c759c148e38cdad2db62f7158cb3236b37a144cabb933</cites><orcidid>0000-0002-5596-0952 ; 0000-0003-2580-6900 ; 0000-0001-7705-649X ; 0000-0002-4752-9599</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,3245,27901,27902</link.rule.ids></links><search><creatorcontrib>Makhotkin, Igor A.</creatorcontrib><creatorcontrib>Milov, Igor</creatorcontrib><creatorcontrib>Chalupský, Jaromir</creatorcontrib><creatorcontrib>Tiedtke, Kai</creatorcontrib><creatorcontrib>Enkisch, Hartmut</creatorcontrib><creatorcontrib>de Vries, Gosse</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Siewert, Frank</creatorcontrib><creatorcontrib>Sturm, Jacobus M.</creatorcontrib><creatorcontrib>Nikolaev, Konstantin V.</creatorcontrib><creatorcontrib>van de Kruijs, Robbert W. E.</creatorcontrib><creatorcontrib>Smithers, Mark A.</creatorcontrib><creatorcontrib>van Wolferen, Henk A. G. M.</creatorcontrib><creatorcontrib>Keim, Enrico G.</creatorcontrib><creatorcontrib>Louis, Eric</creatorcontrib><creatorcontrib>Jacyna, Iwanna</creatorcontrib><creatorcontrib>Jurek, Marek</creatorcontrib><creatorcontrib>Klinger, Dorota</creatorcontrib><creatorcontrib>Pelka, Jerzy B.</creatorcontrib><creatorcontrib>Juha, Libor</creatorcontrib><creatorcontrib>Hájková, Věra</creatorcontrib><creatorcontrib>Vozda, Vojtěch</creatorcontrib><creatorcontrib>Burian, Tomáš</creatorcontrib><creatorcontrib>Saksl, Karel</creatorcontrib><creatorcontrib>Faatz, Bart</creatorcontrib><creatorcontrib>Keitel, Barbara</creatorcontrib><creatorcontrib>Plönjes, Elke</creatorcontrib><creatorcontrib>Schreiber, Siegfried</creatorcontrib><creatorcontrib>Toleikis, Sven</creatorcontrib><creatorcontrib>Loch, Rolf</creatorcontrib><creatorcontrib>Hermann, Martin</creatorcontrib><creatorcontrib>Strobel, Sebastian</creatorcontrib><creatorcontrib>Donker, Rilpho</creatorcontrib><creatorcontrib>Mey, Tobias</creatorcontrib><creatorcontrib>Sobierajski, Ryszard</creatorcontrib><title>Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold</title><title>Journal of the Optical Society of America. B, Optical physics</title><issn>0740-3224</issn><issn>1520-8540</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNotkMtOwzAURC0EEqWwZusfSOtXmmRZyluVuoAidpHt3DRGSRz5AfQj-GcC7WauNNKd0RyErimZUb4Q8-fNy_JmxtMZISwrihM0oSkjSZ4KcoomJBMk4YyJc3Th_QchRBDGJujnVnZyB1hqHbvYymBsj02PQzOKi6GB3sQO16bt_OhXUUOF1R47GCCYYD4Bw_dgfXSAg8U1dMF60Lav8Pv2DQ-x9eCxgtZ-jZmAvel3LSS-sQFLdewLjYPRaatLdFbL8ePqeKdoe3_3unpM1puHp9VynWgu8pAIOW4kWmfjqKxmQlKZ6ywtNBU58FxXsmKVWrA6o2muFWd8oXgmqRBaKlVwPkXzQ6521nsHdTk400m3Lykp_2iW_zRLnpYHmvwXxE9r-A</recordid><startdate>20181101</startdate><enddate>20181101</enddate><creator>Makhotkin, Igor A.</creator><creator>Milov, Igor</creator><creator>Chalupský, Jaromir</creator><creator>Tiedtke, Kai</creator><creator>Enkisch, Hartmut</creator><creator>de Vries, Gosse</creator><creator>Scholze, Frank</creator><creator>Siewert, Frank</creator><creator>Sturm, Jacobus M.</creator><creator>Nikolaev, Konstantin V.</creator><creator>van de Kruijs, Robbert W. E.</creator><creator>Smithers, Mark A.</creator><creator>van Wolferen, Henk A. G. M.</creator><creator>Keim, Enrico G.</creator><creator>Louis, Eric</creator><creator>Jacyna, Iwanna</creator><creator>Jurek, Marek</creator><creator>Klinger, Dorota</creator><creator>Pelka, Jerzy B.</creator><creator>Juha, Libor</creator><creator>Hájková, Věra</creator><creator>Vozda, Vojtěch</creator><creator>Burian, Tomáš</creator><creator>Saksl, Karel</creator><creator>Faatz, Bart</creator><creator>Keitel, Barbara</creator><creator>Plönjes, Elke</creator><creator>Schreiber, Siegfried</creator><creator>Toleikis, Sven</creator><creator>Loch, Rolf</creator><creator>Hermann, Martin</creator><creator>Strobel, Sebastian</creator><creator>Donker, Rilpho</creator><creator>Mey, Tobias</creator><creator>Sobierajski, Ryszard</creator><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0002-5596-0952</orcidid><orcidid>https://orcid.org/0000-0003-2580-6900</orcidid><orcidid>https://orcid.org/0000-0001-7705-649X</orcidid><orcidid>https://orcid.org/0000-0002-4752-9599</orcidid></search><sort><creationdate>20181101</creationdate><title>Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold</title><author>Makhotkin, Igor A. ; Milov, Igor ; Chalupský, Jaromir ; Tiedtke, Kai ; Enkisch, Hartmut ; de Vries, Gosse ; Scholze, Frank ; Siewert, Frank ; Sturm, Jacobus M. ; Nikolaev, Konstantin V. ; van de Kruijs, Robbert W. E. ; Smithers, Mark A. ; van Wolferen, Henk A. G. M. ; Keim, Enrico G. ; Louis, Eric ; Jacyna, Iwanna ; Jurek, Marek ; Klinger, Dorota ; Pelka, Jerzy B. ; Juha, Libor ; Hájková, Věra ; Vozda, Vojtěch ; Burian, Tomáš ; Saksl, Karel ; Faatz, Bart ; Keitel, Barbara ; Plönjes, Elke ; Schreiber, Siegfried ; Toleikis, Sven ; Loch, Rolf ; Hermann, Martin ; Strobel, Sebastian ; Donker, Rilpho ; Mey, Tobias ; Sobierajski, Ryszard</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c348t-4a0020cc77407f24a1a8c759c148e38cdad2db62f7158cb3236b37a144cabb933</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Makhotkin, Igor A.</creatorcontrib><creatorcontrib>Milov, Igor</creatorcontrib><creatorcontrib>Chalupský, Jaromir</creatorcontrib><creatorcontrib>Tiedtke, Kai</creatorcontrib><creatorcontrib>Enkisch, Hartmut</creatorcontrib><creatorcontrib>de Vries, Gosse</creatorcontrib><creatorcontrib>Scholze, Frank</creatorcontrib><creatorcontrib>Siewert, Frank</creatorcontrib><creatorcontrib>Sturm, Jacobus M.</creatorcontrib><creatorcontrib>Nikolaev, Konstantin V.</creatorcontrib><creatorcontrib>van de Kruijs, Robbert W. E.</creatorcontrib><creatorcontrib>Smithers, Mark A.</creatorcontrib><creatorcontrib>van Wolferen, Henk A. G. M.</creatorcontrib><creatorcontrib>Keim, Enrico G.</creatorcontrib><creatorcontrib>Louis, Eric</creatorcontrib><creatorcontrib>Jacyna, Iwanna</creatorcontrib><creatorcontrib>Jurek, Marek</creatorcontrib><creatorcontrib>Klinger, Dorota</creatorcontrib><creatorcontrib>Pelka, Jerzy B.</creatorcontrib><creatorcontrib>Juha, Libor</creatorcontrib><creatorcontrib>Hájková, Věra</creatorcontrib><creatorcontrib>Vozda, Vojtěch</creatorcontrib><creatorcontrib>Burian, Tomáš</creatorcontrib><creatorcontrib>Saksl, Karel</creatorcontrib><creatorcontrib>Faatz, Bart</creatorcontrib><creatorcontrib>Keitel, Barbara</creatorcontrib><creatorcontrib>Plönjes, Elke</creatorcontrib><creatorcontrib>Schreiber, Siegfried</creatorcontrib><creatorcontrib>Toleikis, Sven</creatorcontrib><creatorcontrib>Loch, Rolf</creatorcontrib><creatorcontrib>Hermann, Martin</creatorcontrib><creatorcontrib>Strobel, Sebastian</creatorcontrib><creatorcontrib>Donker, Rilpho</creatorcontrib><creatorcontrib>Mey, Tobias</creatorcontrib><creatorcontrib>Sobierajski, Ryszard</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Optical Society of America. B, Optical physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Makhotkin, Igor A.</au><au>Milov, Igor</au><au>Chalupský, Jaromir</au><au>Tiedtke, Kai</au><au>Enkisch, Hartmut</au><au>de Vries, Gosse</au><au>Scholze, Frank</au><au>Siewert, Frank</au><au>Sturm, Jacobus M.</au><au>Nikolaev, Konstantin V.</au><au>van de Kruijs, Robbert W. E.</au><au>Smithers, Mark A.</au><au>van Wolferen, Henk A. G. M.</au><au>Keim, Enrico G.</au><au>Louis, Eric</au><au>Jacyna, Iwanna</au><au>Jurek, Marek</au><au>Klinger, Dorota</au><au>Pelka, Jerzy B.</au><au>Juha, Libor</au><au>Hájková, Věra</au><au>Vozda, Vojtěch</au><au>Burian, Tomáš</au><au>Saksl, Karel</au><au>Faatz, Bart</au><au>Keitel, Barbara</au><au>Plönjes, Elke</au><au>Schreiber, Siegfried</au><au>Toleikis, Sven</au><au>Loch, Rolf</au><au>Hermann, Martin</au><au>Strobel, Sebastian</au><au>Donker, Rilpho</au><au>Mey, Tobias</au><au>Sobierajski, Ryszard</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold</atitle><jtitle>Journal of the Optical Society of America. B, Optical physics</jtitle><date>2018-11-01</date><risdate>2018</risdate><volume>35</volume><issue>11</issue><spage>2799</spage><pages>2799-</pages><issn>0740-3224</issn><eissn>1520-8540</eissn><doi>10.1364/JOSAB.35.002799</doi><orcidid>https://orcid.org/0000-0002-5596-0952</orcidid><orcidid>https://orcid.org/0000-0003-2580-6900</orcidid><orcidid>https://orcid.org/0000-0001-7705-649X</orcidid><orcidid>https://orcid.org/0000-0002-4752-9599</orcidid><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0740-3224 |
| ispartof | Journal of the Optical Society of America. B, Optical physics, 2018-11, Vol.35 (11), p.2799 |
| issn | 0740-3224 1520-8540 |
| language | eng |
| recordid | cdi_crossref_primary_10_1364_JOSAB_35_002799 |
| source | Optica Publishing Group Journals |
| title | Damage accumulation in thin ruthenium films induced by repetitive exposure to femtosecond XUV pulses below the single-shot ablation threshold |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T22%3A28%3A47IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Damage%20accumulation%20in%20thin%20ruthenium%20films%20induced%20by%20repetitive%20exposure%20to%20femtosecond%20XUV%20pulses%20below%20the%20single-shot%20ablation%20threshold&rft.jtitle=Journal%20of%20the%20Optical%20Society%20of%20America.%20B,%20Optical%20physics&rft.au=Makhotkin,%20Igor%20A.&rft.date=2018-11-01&rft.volume=35&rft.issue=11&rft.spage=2799&rft.pages=2799-&rft.issn=0740-3224&rft.eissn=1520-8540&rft_id=info:doi/10.1364/JOSAB.35.002799&rft_dat=%3Ccrossref%3E10_1364_JOSAB_35_002799%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |