Low Temperature Deposition of WN x C y Diffusion Barriers Using WN(NEt 2 ) 3 as a Single-Source Precursor

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Veröffentlicht in:ECS journal of solid state science and technology 2015, Vol.4 (1), p.N3180-N3187
Hauptverfasser: O’Donohue, C. T., McClain, K. R., Koley, A., Revelli, J. C., McElwee-White, L., Anderson, T. J.
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container_end_page N3187
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container_title ECS journal of solid state science and technology
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creator O’Donohue, C. T.
McClain, K. R.
Koley, A.
Revelli, J. C.
McElwee-White, L.
Anderson, T. J.
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doi_str_mv 10.1149/2.0251501jss
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source IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
title Low Temperature Deposition of WN x C y Diffusion Barriers Using WN(NEt 2 ) 3 as a Single-Source Precursor
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