Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon

Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon

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Veröffentlicht in:Journal of the Electrochemical Society 2012-01, Vol.159 (2), p.H79-H84
Hauptverfasser: Sarioglu, A. Fatih, Kupnik, Mario, Vaithilingam, Srikant, Khuri-Yakub, Butrus T.
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container_end_page H84
container_issue 2
container_start_page H79
container_title Journal of the Electrochemical Society
container_volume 159
creator Sarioglu, A. Fatih
Kupnik, Mario
Vaithilingam, Srikant
Khuri-Yakub, Butrus T.
description
doi_str_mv 10.1149/2.005202jes
format Article
fullrecord <record><control><sourceid>crossref</sourceid><recordid>TN_cdi_crossref_primary_10_1149_2_005202jes</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>10_1149_2_005202jes</sourcerecordid><originalsourceid>FETCH-LOGICAL-c233t-1ac40df301c2cd5aed3f8bba938cc2e4eb1099c10d709e6bf6beb7884c8c34f93</originalsourceid><addsrcrecordid>eNo9kM1KAzEURoMoWKsrXyB7Sc1NMj9ZlmKrUCxoXcqQydxMp6STkgzavr0tiqvDt_jO4hByD3wCoPSjmHCeCS62mC7ICLTKWAEAl2TEOUim8gyuyU1K29OEUhUj8vlq-pCs8UjXYR_aaPabIw2OrjcYd8b7I1vE8N3T1aFrkM47v0vUDPStazcDm_atx4bOQv-FhxNijzGd3--d72zob8mVMz7h3R_H5GP-tJ49s-Vq8TKbLpkVUg4MjFW8cZKDFbbJDDbSlXVttCytFaiwBq61Bd4UXGNeu7zGuihLZUsrldNyTB5-vTaGlCK6ah-7nYnHCnh1LlOJ6r-M_AGBLFgs</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon</title><source>IOP Publishing Journals</source><creator>Sarioglu, A. Fatih ; Kupnik, Mario ; Vaithilingam, Srikant ; Khuri-Yakub, Butrus T.</creator><creatorcontrib>Sarioglu, A. Fatih ; Kupnik, Mario ; Vaithilingam, Srikant ; Khuri-Yakub, Butrus T.</creatorcontrib><identifier>ISSN: 0013-4651</identifier><identifier>EISSN: 1945-7111</identifier><identifier>DOI: 10.1149/2.005202jes</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 2012-01, Vol.159 (2), p.H79-H84</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c233t-1ac40df301c2cd5aed3f8bba938cc2e4eb1099c10d709e6bf6beb7884c8c34f93</citedby><cites>FETCH-LOGICAL-c233t-1ac40df301c2cd5aed3f8bba938cc2e4eb1099c10d709e6bf6beb7884c8c34f93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Sarioglu, A. Fatih</creatorcontrib><creatorcontrib>Kupnik, Mario</creatorcontrib><creatorcontrib>Vaithilingam, Srikant</creatorcontrib><creatorcontrib>Khuri-Yakub, Butrus T.</creatorcontrib><title>Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon</title><title>Journal of the Electrochemical Society</title><issn>0013-4651</issn><issn>1945-7111</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><recordid>eNo9kM1KAzEURoMoWKsrXyB7Sc1NMj9ZlmKrUCxoXcqQydxMp6STkgzavr0tiqvDt_jO4hByD3wCoPSjmHCeCS62mC7ICLTKWAEAl2TEOUim8gyuyU1K29OEUhUj8vlq-pCs8UjXYR_aaPabIw2OrjcYd8b7I1vE8N3T1aFrkM47v0vUDPStazcDm_atx4bOQv-FhxNijzGd3--d72zob8mVMz7h3R_H5GP-tJ49s-Vq8TKbLpkVUg4MjFW8cZKDFbbJDDbSlXVttCytFaiwBq61Bd4UXGNeu7zGuihLZUsrldNyTB5-vTaGlCK6ah-7nYnHCnh1LlOJ6r-M_AGBLFgs</recordid><startdate>20120101</startdate><enddate>20120101</enddate><creator>Sarioglu, A. Fatih</creator><creator>Kupnik, Mario</creator><creator>Vaithilingam, Srikant</creator><creator>Khuri-Yakub, Butrus T.</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>20120101</creationdate><title>Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon</title><author>Sarioglu, A. Fatih ; Kupnik, Mario ; Vaithilingam, Srikant ; Khuri-Yakub, Butrus T.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c233t-1ac40df301c2cd5aed3f8bba938cc2e4eb1099c10d709e6bf6beb7884c8c34f93</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sarioglu, A. Fatih</creatorcontrib><creatorcontrib>Kupnik, Mario</creatorcontrib><creatorcontrib>Vaithilingam, Srikant</creatorcontrib><creatorcontrib>Khuri-Yakub, Butrus T.</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sarioglu, A. Fatih</au><au>Kupnik, Mario</au><au>Vaithilingam, Srikant</au><au>Khuri-Yakub, Butrus T.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2012-01-01</date><risdate>2012</risdate><volume>159</volume><issue>2</issue><spage>H79</spage><epage>H84</epage><pages>H79-H84</pages><issn>0013-4651</issn><eissn>1945-7111</eissn><doi>10.1149/2.005202jes</doi></addata></record>
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language eng
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title Nanoscale Topography of Thermally-Grown Oxide Films at Right-Angled Convex Corners of Silicon
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T13%3A01%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-crossref&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Nanoscale%20Topography%20of%20Thermally-Grown%20Oxide%20Films%20at%20Right-Angled%20Convex%20Corners%20of%20Silicon&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Sarioglu,%20A.%20Fatih&rft.date=2012-01-01&rft.volume=159&rft.issue=2&rft.spage=H79&rft.epage=H84&rft.pages=H79-H84&rft.issn=0013-4651&rft.eissn=1945-7111&rft_id=info:doi/10.1149/2.005202jes&rft_dat=%3Ccrossref%3E10_1149_2_005202jes%3C/crossref%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true