Study of Process Variation in Nanotube Tunnel Field Effect Transistor

In the nanoscale, the process parameters and device dimension variation extensively affect the electrical performance of the device. Therefore, an inclusive study for the prediction of the overall device behavior is extremely necessary. In this manuscript, process variations caused by random dopant fluctuation (RDFs), variation of oxide thickness, and workfunction during fabrication are analyzed in junctionless nanotube TFET. The work quantitatively evaluates the impact of process variability on the various electrical parameters like energy band diagram, electric field, carrier concentration, and drain current of the nanotube TFET structure. The device simulation has been carried out with a 3-D SILVACO ATLAS simulator.