Study of the Influence of the Rare Earth Elements (Ce3+ and Ce4+) Concentration on the Siloxanes Coating Applied on the Copper Surface
This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane films deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane films deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently. |
---|---|
ISSN: | 1938-5862 1938-6737 |
DOI: | 10.1149/1.4704931 |