Study of the Influence of the Rare Earth Elements (Ce3+ and Ce4+) Concentration on the Siloxanes Coating Applied on the Copper Surface

This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane films deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization...

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Hauptverfasser: Basho, Érika N., Sakai, Rafael T., Da Cruz, Fabíola M., De Melo, Hercilio G., Benedetti, Assis V., Suegama, Patrícia H.
Format: Tagungsbericht
Sprache:eng
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Zusammenfassung:This work studied the influence of the rare earth (Ce3+ and Ce4+) elements concentration in polysiloxane films deposited on copper by dip-coating process, and evaluated their resistance in a 3.5 wt.% NaCl medium. Classical electrochemistry techniques were used as open circuit potential, polarization curves and electrochemical impedance spectroscopy. The results revealed that by adding low concentration of Ce4+ ions, the coating prevents the electrolyte uptake any longer retarding the substrate degradation consequently.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.4704931