Nonvolatile Memory Effects of NiO Layers Embedded in Al[sub 2]O[sub 3] High-k Dielectrics Using Atomic Layer Deposition

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Veröffentlicht in:	Electrochemical and solid-state letters 2010, Vol.13 (6), p.H209
Hauptverfasser:	Cho, Wontae, Lee, Sun Sook, Chung, Taek-Mo, Kim, Chang Gyoun, An, Ki-Seok, Ahn, Jae-Pyoung, Lee, Jun-Young, Lee, Jong-Won, Hwang, Jin-Ha
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Sprache:	eng
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doi_str_mv	10.1149/1.3380827
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title	Nonvolatile Memory Effects of NiO Layers Embedded in Al[sub 2]O[sub 3] High-k Dielectrics Using Atomic Layer Deposition
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