High Thermal Stability AlGaAs/InGaAs Enhancement-Mode pHEMT Using Iridium Buried-Gate Technology
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Veröffentlicht in: | Journal of the Electrochemical Society 2009, Vol.156 (12), p.H877 |
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container_issue | 12 |
container_start_page | H877 |
container_title | Journal of the Electrochemical Society |
container_volume | 156 |
creator | Chiu, Hsien-Chin Yang, Chih-Wei Chen, Chao-Hung Lin, Che-Kai Wang, Cheng-Shun Fu, Jeffrey S. |
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doi_str_mv | 10.1149/1.3230675 |
format | Article |
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source | IOP Publishing Journals |
title | High Thermal Stability AlGaAs/InGaAs Enhancement-Mode pHEMT Using Iridium Buried-Gate Technology |
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