Normal Pressure CVD - an Easy and Sustainable Method for Technical Surface Functionalisation

The PYROSIL ® technique is a well known process which is used to produce SiOx layers by using Combustion Chemical Vapour Deposition (C-CVD) in order to modify surfaces and their properties like the adhesion promotion. Another method to deposit oxides at atmospheric pressure is the use of potential free plasmas like plasma blaster or plasma jets for the decomposition of the precursors (AP-CVD). As precursors liquid and gaseous compounds or suspensions with nanoparticles can be used, which are pyrolysed by flame or plasma. The process energy especially during the flame treatment serves additional as a heating source for the substrate. The AP- or C-CVD coatings have the potential for several different applications e.g. antireflective coatings on glass for solar industry, antimicrobial or photo catalytic coatings. Current results and several different aspects for the application of this technology will be presented.