Structures, Properties and Applications of Functional Thin Films by ALD

This paper gives an overview of the use of Atomic Layer deposition (ALD) technique for the emerging and non mainstream ALD applications. These include a special focus on ALD fabrication of multifunctional protective oxide thin films, and textured thin films for electrical, optoelectronic devices, as well textured templates for the cost-effective growth of highly oriented nanowires for light emitting diodes (LED), field-effect transistor (FET) and catalysts with high activity and electivity.