Integration and Applications of Electrochemically-Etched Silicon Nanowires

Integration and Applications of Electrochemically-Etched Silicon Nanowires

Silicon nanowires (SiNW) are fabricated through electroless etching of single crystal silicon. The nanowires are separated from substrate, deposited onto electrodes and annealed. Nanowire silicidation methods and analysis of silicides including electrical characterization, SEM, TEM and sputter XPS,...

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Veröffentlicht in:ECS transactions 2008-10, Vol.16 (3), p.237-244
Hauptverfasser: Xu, Wanli, Flake, J. C.
Format: Artikel
Sprache:eng
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Zusammenfassung:Silicon nanowires (SiNW) are fabricated through electroless etching of single crystal silicon. The nanowires are separated from substrate, deposited onto electrodes and annealed. Nanowire silicidation methods and analysis of silicides including electrical characterization, SEM, TEM and sputter XPS, and XANES are considered.
ISSN:1938-5862
1938-6737
DOI:10.1149/1.2982561