Evaluation of Novel Sr Precursors for Atomic Layer Deposition of SrO Thin Film

Novel strontium precursor - bis(1-methoxy-2,2,6,6-tetramethyl-3,5-heptanedionato)strontium (Sr(MTHD)2) - was prepared and its deposition properties were evaluated.High vapor pressure and excellent conformality of Sr(MTHD)2 make it promising candidate for ALD precursor to deposit high-k dielectric ma...

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Hauptverfasser:	Kim, Ki-Chul, Cho, Kyuho, Lee, Kwanghee, Kim, Younsoo, Choi, Jae H., Lim, Jae-Soon, Kim, Jin Y., Kim, Wan-Don, Kwon, Oh S., Tak, Yong S., Chung, Jeong-Hee, Kim, Young-Sun, Kim, Sung-Tae, Han, Woosung
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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Zusammenfassung:	Novel strontium precursor - bis(1-methoxy-2,2,6,6-tetramethyl-3,5-heptanedionato)strontium (Sr(MTHD)2) - was prepared and its deposition properties were evaluated.High vapor pressure and excellent conformality of Sr(MTHD)2 make it promising candidate for ALD precursor to deposit high-k dielectric materials such as SrTiO3.
ISSN:	1938-5862 1938-6737
DOI:	10.1149/1.2779077