Characterisation of High Temperature CVD Iron

The growth and analysis of iron thin films by low-pressure chemical vapor deposition (CVD) from a liquid source precursor iron pentacarbonyl (Fe(CO)5) is reported. The layers were deposited at 200-400C and 0.75 mbar on 100mm oxidised silicon substrates. Hydrogen was used as diluent gas. Layers between 120nm and 245nm were achieved for 20-minute process runs. Lower temperature layers were more porous. The resistivity of a 120nm thick layer deposited at 300C was 20 micro-ohm-cm. X- ray diffraction (XRD) analysis yielded peaks of α-Fe 110 & 200 body-centered-cubic (bcc) lattice. The highest magnetisation value was 1518emu/cm3 for the 300C layer. The lowest coercivity was 31Oe. Conformal coating of CVD Iron is demonstrated.